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Lecture – 1 Introduction on VLSI Design |
Electronics Engineering |
49 min |
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Lecture – 2 Bipolar Junction Transistor Fabrication |
Electronics Engineering |
49 min |
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Lecture – 3 MOSFET Fabrication for IC |
Electronics Engineering |
50 min |
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Lecture – 4 Crystal Structure of Si |
Electronics Engineering |
51 min |
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Lecture – 5 Crystal Structure contd |
Electronics Engineering |
48 min |
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Lecture – 6 Defects in Crystal + Crystal growth |
Electronics Engineering |
49 min |
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Lecture – 7 Crystal growth Contd + Epitaxy I |
Electronics Engineering |
51 min |
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Lecture – 8 Epitaxy II – Vapour phase Epitaxy |
Electronics Engineering |
53 min |
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Lecture – 9 Epitaxy III – Doping during Epitaxy |
Electronics Engineering |
43 min |
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Lecture – 10 Molecular beam Epitaxy |
Electronics Engineering |
48 min |
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Lecture – 11 Oxidation I – Kinetics of Oxidation |
Electronics Engineering |
52 min |
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Lecture – 12 Oxidation II Oxidation rate constants |
Electronics Engineering |
52 min |
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Lecture – 13 Oxidation III – Dopant Redistribution |
Electronics Engineering |
51 min |
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Lecture – 14 Oxidation IV – Oxide Charges |
Electronics Engineering |
44 min |
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Lecture – 15 Diffusion I – Theory of Diffusion |
Electronics Engineering |
54 min |
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Lecture – 16 Diffusion II – Infinite Source |
Electronics Engineering |
43 min |
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Lecture – 17 Diffusion III – Actual Doping Profiles |
Electronics Engineering |
52 min |
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Lecture – 18 Diffusion IV Diffusion Systems |
Electronics Engineering |
55 min |
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Lecture – 19 Ion – Implantation Process |
Electronics Engineering |
55 min |
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Lecture – 20 Ion – Implantation Process |
Electronics Engineering |
51 min |
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Lecture – 21 Annealing of Damages |
Electronics Engineering |
52 min |
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Lecture – 22 Masking during Implantation |
Electronics Engineering |
53 min |
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Lecture – 23 Lithography – I |
Electronics Engineering |
53 min |
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Lecture – 24 Lithography – II |
Electronics Engineering |
39 min |
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Lecture – 25 Wet Chemical Etching |
Electronics Engineering |
54 min |
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Lecture – 26 Dry Etching |
Electronics Engineering |
52 min |
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Lecture – 27 Plasma Etching Systems |
Electronics Engineering |
52 min |
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Lecture – 28 Etching of Si,Sio2,SiN and other materials |
Electronics Engineering |
52 min |
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Lecture – 29 Plasma Deposition Process |
Electronics Engineering |
51 min |
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Lecture – 30 Metalization – I |
Electronics Engineering |
51 min |
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Lecture – 31 Problems in Aluminium Metal contacts |
Electronics Engineering |
49 min |
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Lecture – 32 IC BJT – From junction isolation to LOCOS |
Electronics Engineering |
42 min |
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Lecture – 33 Problems in LOCOS + Trench isolation |
Electronics Engineering |
55 min |
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Lecture – 34 More about BJT Fabrication and Realization |
Electronics Engineering |
51 min |
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Lecture – 35 Circuits + Transistors in ECL Circuits |
Electronics Engineering |
48 min |
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Lecture – 36 MOSFET I – Metal gate vs Self-aligned Poly-gate |
Electronics Engineering |
57 min |
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Lecture – 37 MOSFET II Tailoring of Device Parameters |
Electronics Engineering |
51 min |
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Lecture – 38 CMOS Technology |
Electronics Engineering |
50 min |
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Lecture – 39 Latch – up in CMOS |
Electronics Engineering |
41 min |
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Lecture – 40 BICMOS Technology |
Electronics Engineering |
44 min |
Click to view videos |
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